德國(guó)osiris
2025-05-26
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Osiris勻膠機(jī)
Systems for processing single-wafers with customized substrate processing options for semiconductor and microsystems technology.
SPIN COATER - CCP
Designed to be used in applications:
SPIN COATING with Covered Chuck Processor (CCP)
1. UNIXX S760+
(21x21 inch) Stand-alone system
spin coater for large substrates.
2. UNIXX SA30+
(?300mm) Stand-alone system with
covered chuck spin coater. (single base frame)
3. UNIXX SHp22+
(?200mm) Stand-alone system with
covered chuck spin coater & hotplate module.
SPIN COATER - open bowl
Designed to be used in applications:
SPIN COATING with open-bowl for standard coating.
1. UNIXX SA30
(?300mm) Stand-alone system with
open bowl spin coater. (single base frame)
2. UNIXX SHe22
(?200mm) Stand-alone system with
open bowl spin coater & hotplate module.
免責(zé)聲明：以上所展示的信息由企業(yè)自行提供，內(nèi)容的真實(shí)性、準(zhǔn)確性和合法性由發(fā)布企業(yè)負(fù)責(zé)，化工儀器網(wǎng)對(duì)此不承擔(dān)任何保證責(zé)任。
邁可諾技術(shù)有限公司
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