目錄:賽默飛電子顯微鏡>>FIB-SEM DualBeam>> Helios 5 Laser PFIB System
The Thermo Scientific Helios 5 Laser PFIB System combines the best-in-class monochromated Elstar Scanning Electron Microscopy (SEM) Column with a plasma focused ion beam (PFIB) and a femtosecond laser to produce a high-resolution imaging and analysis tool with in-situ ablation capability, offering unprecedented material removal rates for fast millimeter-scale characterization at nanometer resolution.
Key Features
Millimeter-scale cross sections with up to 15,000x faster material removal than a typical gallium focused ion beam.
The same coincident point for all 3 beams (SEM/PFIB/laser) enables accurate and repeatable cut placement and 3D characterization.
Includes non-conductive or ion-beam-sensitive samples.
High-quality gallium-free TEM and APT sample preparation and high-resolution imaging capabilities.
Acquire data for much larger volumes within a shorter amount of time.
Extraction of subsurface TEM lamella or chunks for 3D analysis.
No need to transfer samples between different instruments for imaging and cross-sectioning.
Specifications
| Femtosecond-laser specifications | ||
|---|---|---|
| Laser integration |
| |
| Laser Output | ||
| First Harmonic |
| 1030 nm (IR) |
| <280 fs | |
| Second Harmonic |
| 515 nm (green) |
| <300 fs | |
| Optics | ||
| Coincident point |
| |
| Objective lens |
| |
| Polarization |
| |
| Repetition rate |
| |
| Position accuracy |
| |
| Protective shutter |
| |
| Software |
| |
| Safety |
| |
(空格分隔,最多3個(gè),單個(gè)標(biāo)簽最多10個(gè)字符)